264 / 2021-11-07 22:37:32
Regulation of Surface Trap Distribution on Silicone Rubber by Radio Frequency Fluorocarbon Plasma
Silicon rubber,CF4,RF capacitive coupled plasma,Surface trap distribution
终稿
Wenhu Han / Xi’an Jiaotong University
Chenxu Wang / Xi’an Jiaotong University
Bo Zhang / Xi’an Jiaotong University
Yunhao Sun / Xi’an Jiaotong University
Xiong Yang / Xi’an Jiaotong University
Guanjun Zhang / Xi'an Jiaotong University
The surface trap distribution of insulating materials has a significant effect on the electrical resistance along the surface. Therefore, RF capacitive coupled plasma (CCP) was applied to modify the surface of silicone rubber in low-pressure CF4 gas. A one-dimensional fluid model of CCP based COMSOL simulation software was established. The electron temperature, electron number density, and ion density distribution of plasma were analyzed, and the surface treatment parameters of plasma were determined. The surface morphology and chemical structure of samples were observed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The charge attenuation and the trap distribution were measured by an isothermal surface potential attenuation system. The results show that CCP treatment can introduce fluorinated groups into the surface of silicone rubber and increase the surface roughness. After CCP treatment, the surface charge attenuation of silicone rubber is inhibited and the electron trap is deepened, which is beneficial to suppress the development of secondary electron collapse on the surface and improve its electrical resistance along the surface.

 
重要日期
  • 会议日期

    07月11日

    2023

    08月18日

    2023

  • 11月10日 2021

    初稿截稿日期

  • 12月10日 2021

    注册截止日期

  • 12月11日 2021

    报告提交截止日期

主办单位
IEEE IAS
承办单位
IEEE IAS Student Chapter of Southwest Jiaotong University (SWJTU)
IEEE IAS Student Chapter of Huazhong University of Science and Technology (HUST)
IEEE PELS (Power Electronics Society) Student Chapter of HUST
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