Regulation of surface trap distribution on silicone rubber by radio frequency fluorocarbon plasma 2nd China International Youth Conference on Electrical Engineering CIYCEE 2021

报告详情

Regulation of surface trap distribution on silicone rubber by radio frequency fluorocarbon plasma

编号：199 访问权限：仅限参会人更新：2021-12-03 10:46:49 浏览：589次口头报告

报告开始：2021年12月16日 10:45（Asia/Shanghai）

报告时间：15min

所在会场：[D] High voltage and insulation technology [D4] Session 22

视频无权播放演示文件

提示：该报告下的文件权限为仅限参会人，您尚未登录，暂时无法查看。

摘要

The surface trap distribution of insulating materials has a significant effect on the electrical resistance along the surface. Therefore, RF capacitive coupled plasma (CCP) was applied to modify the surface of silicone rubber in low-pressure CF₄ gas. A one-dimensional fluid model of CCP based COMSOL simulation software was established. The electron temperature, electron number density, and ion density distribution of plasma were analyzed, and the surface treatment parameters of plasma were determined. The surface morphology and chemical structure of samples were observed by scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The charge attenuation and the trap distribution were measured by an isothermal surface potential attenuation system. The results show that CCP treatment can introduce fluorinated groups into the surface of silicone rubber and increase the surface roughness. After CCP treatment, the surface charge attenuation of silicone rubber is inhibited and the electron trap is deepened, which is beneficial to suppress the development of secondary electron collapse on the surface and improve its electrical resistance along the surface.

关键词

Silicon rubber,CF4,RF capacitive coupled plasma,Surface trap distribution

报告人

Wenhu Han

Xi’an Jiaotong University

稿件作者

Wenhu Han Xi’an Jiaotong University

Chenxu Wang Xi’an Jiaotong University

Bo Zhang Xi’an Jiaotong University

Yunhao Sun Xi’an Jiaotong University

Xiong Yang Xi’an Jiaotong University

Guanjun Zhang Xi'an Jiaotong University

发表评论

全部评论

重要日期

会议日期

07月11日

2023

至

08月18日

2023
11月10日 2021

初稿截稿日期
12月10日 2021

注册截止日期
12月11日 2021

报告提交截止日期

主办单位

IEEE IAS

承办单位

IEEE IAS Student Chapter of Southwest Jiaotong University (SWJTU)
IEEE IAS Student Chapter of Huazhong University of Science and Technology (HUST)
IEEE PELS (Power Electronics Society) Student Chapter of HUST