802 / 2022-03-31 23:10:03
Effect of polishing on surface charging and flashover characteristics of the basin spacer in GIS/GIL under AC condition
polishing,gil,spacer,surface charge
终稿
Yuhuai Wang / Tainjin University
Jin Li / Tianjin University
Liming Zhang / State Grid Tianjin Electric Power Company
Yaxiang Wang / Ltd.;Pinggao Group Co.
Liucheng Hao / Pinggao Group
Haoliang Liu / Tianjin University
Boxue Du / Tianjin University
Purpose/Aim

As a key component of DC GIL, basin spacers have experienced repeatedly random surface discharge along the surface polishing area, which seriously threatens the reliable operation of GIS/GIL. It is necessary to investigate the influence of surface polishing on surface charging and flashover characteristics of spacer in GIS/GIL under DC condition.

Experimental/Modeling methods

To investigate the influence of surface polishing on surface charging and flashover characteristic, the basin spacers were treated with circumferential and radial polishing. The surface charge distribution of untreated and polished spacers were measured after 1 hours’ voltage application of ± 15 kV. The surface flashover voltages under DC, DC pre-voltage were compared and analyzed. The changes of surface morphology before and after polishing treatment were measured by SEM and EDS.

Results/discussion

The results show that large amount of homo-polar charges are accumulated on the untreated spacer surface. However, more accumulated heteropolar charges were observed on the polished area and outward expansion area. Polishing orientation has an effect on the flashover voltage. Compared with circumferential polished spacer, the flashover voltage of radial polished spacer decreased obviously. The flashover voltage of the radial polished spacer decreased 11% under positive pre-loading condition.

Conclusions

The correlation between the polishing orientation and the surface charge accumulation was investigated. It is confirmed that micro discharge caused by the change of surface morphology is responsible for heteropolar charge accumulation on the polished area.

 
重要日期
  • 会议日期

    09月25日

    2022

    09月29日

    2022

  • 08月15日 2022

    提前注册日期

  • 09月10日 2022

    报告提交截止日期

  • 11月10日 2022

    注册截止日期

  • 11月30日 2022

    初稿截稿日期

  • 11月30日 2022

    终稿截稿日期

主办单位
IEEE DEIS
承办单位
Chongqing University
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