118 / 2024-10-15 13:52:15

Influence of Magnetron Sputtering Bias Voltage on Hardness and Corrosion Resistance of VAlTiCrZr HEA Films

HEA,amorphous,Magnetron Sputtering

VAlTiCrZr amorphous high-entropy alloy (HEA) films were prepared using magnetron sputtering technology. Influence of bias voltage on the microstructure, hardness, and corrosion resistance were studied. The formation mechanism of the film was analyzed using thermodynamic calculations, and the morphology and composition of the films were observed and analyzed using XRD and SEM/EDS. Hardness was measured with a Vickers hardness tester, and corrosion resistance was measured in 3.5% NaCl solution. The results showed that the VAlTiCrZr HEA films prepared at different bias voltages were all amorphous structures, which caused by the composition conditions of HEA. The distribution of each element in the film was uniform, and the thickness of the film first increases and then decreases with the increasing of bias voltage. The hardness and corrosion resistance of the film has a positive relationship with its thickness. Compared with 304 stainless steel, the hardness and corrosion resistance of the magnetron sputtered HEA amorphous films are significantly improved.