It is our great pleasure to announce that the 14th International Conference on Plasma Based Ion Implantation & Deposition, PBII&D 2017 will be held at the Changning Campus of Shanghai Institute of Ceramics, Chinese Academy of Sciences (SIC CAS), Shanghai, China, during October 17-20, 2017.

Organised every two years, the PBII&D conference is the occasion to present latest scientific developments and detect future trends concerning plasma based ion assisted surface treatments and thin films deposition. This conference is designed to bring you a fruitful gathering, allowing the contact with key researchers from all regions of the world, opening up opportunities for new collaborations at global level.