活动简介
This conference will address the broad issues in the growing and very demanding field of surface metrology and characterization of optics for EUV/X-Ray synchrotron and FEL radiation and for other EUV/X-Ray applications such as astronomical imaging, solar physics, and lithography.
Improving the performance of existing instrumentation and techniques, as well as developing new and novel ones, is critical for the fabrication of high-quality optics to meet current and future requirements for these applications.
征稿信息
征稿范围
Papers are solicited on the following and related topics:
- surface figure and finish measurement
- slope profilometry and interferometry
- sub-aperture stitching
- wavefront sensing and characterization
- at-wavelength metrology of x-ray and EUV optics
- metrology of x-ray astronomy optics
- metrology of coherence-preserving mirrors
- metrology data analysis software and error reduction
- metrology of adaptive optics
- mirror characterization using scattering techniques
- mirror specification and tolerancing
- novel instrumentation and techniques
- mirror performance simulation using metrology data calibration tools and methods.
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重要日期
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会议日期
08月28日
2016
至09月01日
2016
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09月01日 2016
注册截止日期
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