Suggested topics for Photomask submissions include, but are not limited to: 

Computational Lithography

• Optical Proximity Correction (OPC)

• Source/mask optimization (SMO)

• Mask imaging / mask 3D effects

• Simulation and modeling-design for manufacturability.

Mask Technology

• Mask data preparation (MDP)

• Mask process correction (MPC)

• Advanced data preparation techniques

• Novel jobdeck requirements for new write formats

• Substrates and materials

• Patterning tools and processes

• Resist and resist processing and etch

• Metrology, inspection, repair

• Cleaning, contamination, and haze

• EUV mask technologies

• Equipment infrastructure

• Blank and resist

• Actinic and non-actinic characterization strategies

• Pellicles

• Multi-patterning, optical and EUV hybrid.

Imaging and Emerging Mask Technologies

• Nano imprint mask making and applications

• Multi-beam mask writers

• Alternative mask technologies

• High NA-anamorphic impacts on mask- Grey-scale masks

• Direct-write, maskless lithography

• Inverse lithography and pixelated mask technology.

Mask Application

• Patterned media

• Flat panel display

• MEMS patterning

• Silicon photonics.

Mask Business

• Mask manufacturing management

• Mask management in wafer fabs

• Business aspects of masks

• Infrastructure challenges.

Special Sessions

• Student only competing for Photronics Award and ZEISS Award.

• Panel Discussion.

• Masks for alternate lithography applications.