Suggested topics for submissions include, but are not limited to: 

• Mask Making

• mask data preparation

• substrates and materials

• patterning tools and processes

• resist and resist processing

• etch techniques

• metrology

• inspection

• repair

• cleaning, contamination, and haze

• mask process correction.

• EUV Mask Technologies

• mask making

• equipment infrastructure

• blank and resist

• high NA: anamorphic impacts on mask

• actinic and non-actinic characterization strategies

• optical implementation

• source/mask optimization

• pellicles

• multipatterning, optical and EUV hybrid.

• Emerging Mask Technologies

• nanoimprint mask making and applications

• multibeam mask writers

• alternative mask technologies

• grey-scale masks

• direct-write, maskless lithography

• inverse lithography and pixelated mask technology.

• Computational Lithography

• edge placement error

• source/mask optimization

• advanced data preparation techniques

• novel jobdeck requirements for new write formats

• resolution enhancement techniques and OPC

• design for manufacturability

• simulation and modeling.

• Mask Application

• patterned media

• flat panel display

• MEMS patterning

• silicon photonics.

• Mask Business

• mask manufacturing management

• mask management in wafer fabs

• business aspects of masks

• infrastructure challenges.

• Special Sessions

• Student only competing for Photronics Award and ZIESS Award.

• Panel Discussion.

• Masks for alternate lithography applications.